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Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
Fernandez, S., Kazazis, D., Rajendran, R., Mochi, I., Helfenstein, P., Yoshitake, S., & Ekinci, Y. (2019). Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013506 (6 pp.). https://doi.org/10.1117/1.JMM.18.1.013506
Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
Mochi, I., Timmermans, M. Y., Gallagher, E. E., Mariano, M., Pollentier, I., Rajendran, R., … Ekinci, Y. (2019). Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 014002 (7 pp.). https://doi.org/10.1117/1.JMM.18.1.014002
Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2019). Studying resist performance for contact holes printing using EUV interference lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013501 (11 pp.). https://doi.org/10.1117/1.JMM.18.1.013501
Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists
Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., Jung, T., … Castellanos, S. (2019). Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013504 (10 pp.). https://doi.org/10.1117/1.JMM.18.1.013504
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
Fallica, R., Haitjema, J., Wu, L., Castellanos, S., Brouwer, A. M., & Ekinci, Y. (2018). Absorption coefficient of metal-containing photoresists in the extreme ultraviolet. Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(2), 023505 (7 pp.). https://doi.org/10.1117/1.JMM.17.2.023505
First-row transitional-metal oxalate resists for EUV
Wilklow-Marnell, M., Moglia, D., Steimle, B., Cardineau, B., Al-Mashat, H., Nastasi, P., … Freedman, D. A. (2018). First-row transitional-metal oxalate resists for EUV. Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(4), 043507 (9 pp.). https://doi.org/10.1117/1.JMM.17.4.043507
Extreme ultraviolet patterning of tin-oxo cages
Haitjema, J., Zhang, Y., Vockenhuber, M., Kazazis, D., Ekinci, Y., & Brouwer, A. M. (2017). Extreme ultraviolet patterning of tin-oxo cages. Journal of Micro/Nanolithography, MEMS, and MOEMS, 16(3), 033510 (7 pp.). https://doi.org/10.1117/1.JMM.16.3.033510
RESCAN: An actinic lensless microscope for defect inspection of EUV reticles
Mochi, I., Helfenstein, P., Mohacsi, I., Rajeev, R., Kazazis, D., Yoshitake, S., & Ekinci, Y. (2017). RESCAN: An actinic lensless microscope for defect inspection of EUV reticles. Journal of Micro/Nanolithography, MEMS, and MOEMS, 16(4), 041003 (7 pp.). https://doi.org/10.1117/1.JMM.16.4.041003
Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography
Buitrago, E., Nagahara, S., Yildirim, O., Nakagawa, H., Tagawa, S., Meeuwissen, M., … Ekinci, Y. (2016). Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15(3), 033502 (9 pp.). https://doi.org/10.1117/1.JMM.15.3.033502
Comparative study of line roughness metrics of chemically amplified and inorganic resists for extreme ultraviolet
Fallica, R., Buitrago, E., & Ekinci, Y. (2016). Comparative study of line roughness metrics of chemically amplified and inorganic resists for extreme ultraviolet. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15(3), 34003 (5 pp.). https://doi.org/10.1117/1.JMM.15.3.034003
Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet
Fallica, R., Stowers, J. K., Grenville, A., Frommhold, A., Robinson, A. P. G., & Ekinci, Y. (2016). Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15(3), 033506 (7 pp.). https://doi.org/10.1117/1.JMM.15.3.033506
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
Fan, D., & Ekinci, Y. (2016). Photolithography reaches 6 nm half-pitch using extreme ultraviolet light. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15(3), 033505 (7 pp.). https://doi.org/10.1117/1.JMM.15.3.033505
Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology
Helfenstein, P., Mohacsi, I., Rajeev, R., & Ekinci, Y. (2016). Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15(3), 034006 (5 pp.). https://doi.org/10.1117/1.JMM.15.3.034006
Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates
Del Re, R., Passarelli, J., Sortland, M., Cardineau, B., Ekinci, Y., Buitrago, E., … Brainard, R. L. (2015). Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(4), 043506 (7 pp.). https://doi.org/10.1117/1.JMM.14.4.043506
Toward 10 nm half-pitch in extreme ultraviolet lithography: results on resist screening and pattern collapse mitigation techniques
Kulmala, T. S., Vockenhuber, M., Buitrago, E., Fallica, R., & Ekinci, Y. (2015). Toward 10 nm half-pitch in extreme ultraviolet lithography: results on resist screening and pattern collapse mitigation techniques. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(3), 033507 (9 pp.). https://doi.org/10.1117/1.JMM.14.3.033507
Organometallic carboxylate resists for extreme ultraviolet with high sensitivity
Passarelli, J., Murphy, M., Del Re, R., Sortland, M., Hotalen, J., Dousharm, L., … Brainard, R. L. (2015). Organometallic carboxylate resists for extreme ultraviolet with high sensitivity. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(4), 043503 (10 pp.). https://doi.org/10.1117/1.JMM.14.4.043503
Platinum and palladium oxalates: positive-tone extreme ultraviolet resists
Sortland, M., Hotalen, J., Del Re, R., Passarelli, J., Murphy, M., Kulmala, T. S., … Brainard, R. L. (2015). Platinum and palladium oxalates: positive-tone extreme ultraviolet resists. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(4), 043511 (13 pp.). https://doi.org/10.1117/1.JMM.14.4.043511
Nanoimprint lithography process chains for the fabrication of micro-and nanodevices
Schift, H., Urwyler, P., Kristiansen, P. M., & Gobrecht, J. (2014). Nanoimprint lithography process chains for the fabrication of micro-and nanodevices. Journal of Micro/Nanolithography, MEMS, and MOEMS, 13(3), 31303. https://doi.org/10.1117/1.JMM.13.3.031303
Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
Frommhold, A., Yang, D., McClelland, A., Xue, X., Ekinci, Y., Palmer, R. E., & Robinson, A. P. G. (2013). Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 12(3), 033010 (6 pp.). https://doi.org/10.1117/1.JMM.12.3.033010