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  • (-) Journals = Journal of Micro/Nanolithography, MEMS, and MOEMS
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Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2019). Studying resist performance for contact holes printing using EUV interference lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013501 (11 pp.). https://doi.org/10.1117/1.JMM.18.1.013501
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
Fan, D., & Ekinci, Y. (2016). Photolithography reaches 6 nm half-pitch using extreme ultraviolet light. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15(3), 033505 (7 pp.). https://doi.org/10.1117/1.JMM.15.3.033505
Toward 10 nm half-pitch in extreme ultraviolet lithography: results on resist screening and pattern collapse mitigation techniques
Kulmala, T. S., Vockenhuber, M., Buitrago, E., Fallica, R., & Ekinci, Y. (2015). Toward 10 nm half-pitch in extreme ultraviolet lithography: results on resist screening and pattern collapse mitigation techniques. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(3), 033507 (9 pp.). https://doi.org/10.1117/1.JMM.14.3.033507
Extreme ultraviolet interference lithography at the Paul Scherrer Institut
Auzelyte, V., Dais, C., Farquet, P., Grützmacher, D., Heyderman, L. J., Luo, F., … Solak, H. H. (2009). Extreme ultraviolet interference lithography at the Paul Scherrer Institut. Journal of Micro/Nanolithography, MEMS, and MOEMS, 8(2), 021204 (10 pp.). https://doi.org/10.1117/1.3116559