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Poly(methyl methacrylate)-based nanofluidic device for rapid and multiplexed serological antibody detection of SARS-CoV-2
Mortelmans, T., Kazazis, D., Padeste, C., Berger, P., Li, X., & Ekinci, Y. (2022). Poly(methyl methacrylate)-based nanofluidic device for rapid and multiplexed serological antibody detection of SARS-CoV-2. ACS Applied Nano Materials, 5(1), 517-526. https://doi.org/10.1021/acsanm.1c03309
Pattern collapse mitigation in inorganic resists via a polymer freeze technique
Kulmala, T. S., Buitrago, E., Vockenhuber, M., & Ekinci, Y. (2016). Pattern collapse mitigation in inorganic resists via a polymer freeze technique. Microelectronic Engineering, 155, 39-43. https://doi.org/10.1016/j.mee.2016.02.024
Effect of nanoimprint on the elastic modulus of PMMA: comparison between standard and ultrafast thermal NIL
Pianigiani, M., Kirchner, R., Sovernigo, E., Pozzato, A., Tormen, M., & Schift, H. (2016). Effect of nanoimprint on the elastic modulus of PMMA: comparison between standard and ultrafast thermal NIL. Microelectronic Engineering, 155, 85-91. https://doi.org/10.1016/j.mee.2016.03.019
High aspect ratio nanostructuring by high energy electrons and electroplating
Gorelick, S., Vila-Comamala, J., Guzenko, V. A., & David, C. (2011). High aspect ratio nanostructuring by high energy electrons and electroplating. Microelectronic Engineering, 88(8), 2259-2262. https://doi.org/10.1016/j.mee.2011.02.094
High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating
Gorelick, S., Vila-Comamala, J., Guzenko, V. A., Barrett, R., Salomé, M., & David, C. (2011). High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating. Journal of Synchrotron Radiation, 18(3), 442-446. https://doi.org/10.1107/S0909049511002366
Efficient e-beam lithography exposure strategies for fiffractive X-ray optics
Guzenko, V. A., Romijn, J., Vila-Comamala, J., Gorelick, S., & David, C. (2011). Efficient e-beam lithography exposure strategies for fiffractive X-ray optics. In I. McNulty, C. Eyberger, & B. Lai (Eds.), AIP conference proceedings: Vol. 1365. The 10th international conference on X‐ray microscopy (pp. 92-95). https://doi.org/10.1063/1.3625312
Direct e-beam writing of high aspect ratio nanostructures in PMMA: a tool for diffractive X-ray optics fabrication
Gorelick, S., Vila-Comamala, J., Guzenko, V., Mokso, R., Stampanoni, M., & David, C. (2010). Direct e-beam writing of high aspect ratio nanostructures in PMMA: a tool for diffractive X-ray optics fabrication. Microelectronic Engineering, 87(5-8), 1052-1056. https://doi.org/10.1016/j.mee.2009.11.091
High-efficiency gold fresnel zone plates for multi-keV X-rays
Gorelick, S., Vila-Comamala, J., Guzenko, V. A., Barrett, R., Salomé, M., & David, C. (2010). High-efficiency gold fresnel zone plates for multi-keV X-rays. In I. McNulty, C. Eyberger, & B. Lai (Eds.), AIP conference proceedings: Vol. 1365. The 10th international conference on X-ray microscopy (pp. 88-91). https://doi.org/10.1063/1.3625311
Characterization of extreme ultraviolet resists with interference lithography
Gronheid, R., Solak, H. H., Ekinci, Y., Jouve, A., & Van Roey, F. (2006). Characterization of extreme ultraviolet resists with interference lithography. Microelectronic Engineering, 83(4-9), 1103-1106. https://doi.org/10.1016/j.mee.2006.01.149
Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack
Tao, J., Chen, Y., Zhao, X., Malik, A., & Cui, Z. (2005). Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack. Microelectronic Engineering, 78-79(Spec. issue), 665-669. https://doi.org/10.1016/j.mee.2004.12.082