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Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack
Tao, J., Chen, Y., Zhao, X., Malik, A., & Cui, Z. (2005). Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack. Microelectronic Engineering, 78-79(Spec. issue), 665-669. https://doi.org/10.1016/j.mee.2004.12.082