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Progress in EUV resist screening towards the deployment of high-NA lithography
Allenet, T., Wang, X., Vockenhuber, M., Yeh, C. K., Mochi, I., Santaclara, J. G., … Ekinci, Y. (2021). Progress in EUV resist screening towards the deployment of high-NA lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090J (10 pp.). https://doi.org/10.1117/12.2583983
Progress in EUV resists for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress in EUV resists for contact holes printing using EUV interference lithography. In U. F. W. Behringer & J. Finders (Eds.), Proceedings of SPIE: Vol. 1177. 35th European mask and lithography conference (EMLC 2019) (p. 111770U (8 pp.). https://doi.org/10.1117/12.2535678
Progress in EUV resists towards high-NA EUV lithography
Wang, X., Tasdemir, Z., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Meeuwissen, M., … Ekinci, Y. (2019). Progress in EUV resists towards high-NA EUV lithography. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme ultraviolet (EUV) lithography X (p. 109570A (9 pp.). https://doi.org/10.1117/12.2516260
Progress overview of EUV resists status towards high-NA EUV lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress overview of EUV resists status towards high-NA EUV lithography. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 1114711 (10 pp.). https://doi.org/10.1117/12.2536923
Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2019). Studying resist performance for contact holes printing using EUV interference lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013501 (11 pp.). https://doi.org/10.1117/1.JMM.18.1.013501
Evaluation of EUV resists for 5 nm technology node and beyond
Tasdemir, Z., Wang, X., Mochi, I., van Lent-Protasova, L., Meeuwissen, M., Custers, R., … Ekinci, Y. (2018). Evaluation of EUV resists for 5 nm technology node and beyond. In K. G. Ronse, E. Hendrickx, P. P. Naulleau, P. A. Gargini, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10809. International conference on extreme ultraviolet lithography 2018 (p. 108090L (10 pp.). https://doi.org/10.1117/12.2502688
Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2018). Studying resist performance for contact holes printing using EUV interference lithography. In K. G. Ronse, E. Hendrickx, P. P. Naulleau, P. A. Gargini, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10809. International conference on extreme ultraviolet lithography 2018 (p. 108091Z (13 pp.). https://doi.org/10.1117/12.2501949
State-of-the-art EUV materials and processes for the 7 nm node and beyond
Buitrago, E., Meeuwissen, M., Yildirim, O., Custers, R., Hoefnagels, R., Rispens, G., … Ekinci, Y. (2017). State-of-the-art EUV materials and processes for the 7 nm node and beyond. In E. M. Panning & K. A. Goldberg (Eds.), Proceedings of SPIE: Vol. 10143. Extreme Ultraviolet (EUV) lithography VIII (p. 101430T (8 pp.). https://doi.org/10.1117/12.2260153
Extreme ultraviolet patterning of tin-oxo cages
Haitjema, J., Zhang, Y., Vockenhuber, M., Kazazis, D., Ekinci, Y., & Brouwer, A. M. (2017). Extreme ultraviolet patterning of tin-oxo cages. In E. M. Panning & K. A. Goldberg (Eds.), Proceedings of SPIE: Vol. 10143. Extreme Ultraviolet (EUV) lithography VIII (p. 1014325 (10 pp.). https://doi.org/10.1117/12.2257911
Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography
Tasdemir, Z., Mochi, I., Garrido Olvera, K., Meeuwissen, M., Yildirim, O., Custers, R., … Ekinci, Y. (2017). Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography. In P. A. Gargini, P. P. Naulleau, K. G. Ronse, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10450. International conference on Extreme Ultraviolet lithography 2017 (p. 104501T (10 pp.). https://doi.org/10.1117/12.2280541
SnO<sub>x</sub> high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography
Buitrago, E., Fallica, R., Fan, D., Kulmala, T. S., Vockenhuber, M., & Ekinci, Y. (2016). SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography. Microelectronic Engineering, 155, 44-49. https://doi.org/10.1016/j.mee.2016.02.023
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility
Fan, D., Buitrago, E., Yang, S., Karim, W., Wu, Y., Tai, R., & Ekinci, Y. (2016). Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility. Microelectronic Engineering, 155, 55-60. https://doi.org/10.1016/j.mee.2016.02.026
Photolithography reaches 6 nm half-pitch using EUV light
Fan, D., & Ekinci, Y. (2016). Photolithography reaches 6 nm half-pitch using EUV light. In E. M. Panning & K. A. Goldberg (Eds.), Proceedings of SPIE: Vol. 9776. Extreme ultraviolet (EUV) lithography VII (p. 97761V (11 pp.). https://doi.org/10.1117/12.2219737
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
Fan, D., & Ekinci, Y. (2016). Photolithography reaches 6 nm half-pitch using extreme ultraviolet light. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15(3), 033505 (7 pp.). https://doi.org/10.1117/1.JMM.15.3.033505
Evaluation of EUV resist performance using interference lithography
Buitrago, E., Yildirim, O., Verspaget, C., Tsugama, N., Hoefnagels, R., Rispens, G., & Ekinci, Y. (2015). Evaluation of EUV resist performance using interference lithography. In O. R. Wood II & E. M. Panning (Eds.), Proceedings of SPIE: Vol. 9422. Extreme ultraviolet (EUV) lithography VI (p. 94221S (13 pp.). https://doi.org/10.1117/12.2085803
Toward 10 nm half-pitch in EUV lithography: results on resist screening and pattern collapse mitigation techniques
Kulmala, T. S., Vockenhuber, M., Buitrago, E., Fallica, R., & Ekinci, Y. (2015). Toward 10 nm half-pitch in EUV lithography: results on resist screening and pattern collapse mitigation techniques. In O. R. Wood II & E. M. Panning (Eds.), Proceedings of SPIE: Vol. 9422. Extreme ultraviolet (EUV) lithography VI (p. 942204 (12 pp.). https://doi.org/10.1117/12.2085936
Toward 10 nm half-pitch in extreme ultraviolet lithography: results on resist screening and pattern collapse mitigation techniques
Kulmala, T. S., Vockenhuber, M., Buitrago, E., Fallica, R., & Ekinci, Y. (2015). Toward 10 nm half-pitch in extreme ultraviolet lithography: results on resist screening and pattern collapse mitigation techniques. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(3), 033507 (9 pp.). https://doi.org/10.1117/1.JMM.14.3.033507
EUV resists towards 11 nm half-pitch
Ekinci, Y., Vockenhuber, M., Mojarad, N., & Fan, D. (2014). EUV resists towards 11 nm half-pitch. In O. R. Wood II & E. M. Panning (Eds.), Proceedings of SPIE: Vol. 9048. Extreme ultraviolet (EUV) lithography V (p. 904804 (10 pp.). https://doi.org/10.1117/12.2046459
Ultra-dense silicon nanowires using extreme ultraviolet interference lithography
Fan, D., Sigg, H., Gobrecht, J., Ekinci, Y., & Spolenak, R. (2014). Ultra-dense silicon nanowires using extreme ultraviolet interference lithography. In P. Kallio (Ed.), 2014 international conference on manipulation, manufacturing and measurement on the nanoscale (3M-NANO). Conference proceedings (pp. 122-125). https://doi.org/10.1109/3M-NANO.2014.7057336
Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography
Wang, L., Kirk, E., Wäckerlin, C., Schneider, C. W., Hojeij, M., Gobrecht, J., & Ekinci, Y. (2014). Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography. Nanotechnology, 25(23), 235305 (7 pp.). https://doi.org/10.1088/0957-4484/25/23/235305