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| EUV grazing-incidence lensless imaging wafer metrology
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| High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
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| Illumination control in lensless imaging for EUV mask inspection and review
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| Lensless metrology for semiconductor lithography at EUV
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| Resolution enhancement for lensless mask metrology with RESCAN
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| EUV reticle inspection using phase retrieval algorithms: a performance comparison
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| Phase defect inspection on EUV masks using RESCAN
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| A two-step method for fast and reliable EUV mask metrology
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| Coherent diffractive imaging methods for semiconductor manufacturing
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| Actinic inspection of EUV reticles with arbitrary pattern design
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| Scanning coherent scattering methods for actinic EUV mask inspection
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| Scanning coherent diffractive imaging methods for actinic EUV mask metrology
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| Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology
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| Scanning scattering contrast microscopy for actinic EUV mask inspection
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| Influence of the overlap parameter on the convergence of the ptychographical iterative engine
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